Retraction Note to: Structural and electrochemical impedance spectroscopic studies on reactive magnetron sputtered titanium oxynitride (TiON) thin films

Titanium oxynitride films were deposited onto commercially pure titanium substrates by direct current reactive magnetron sputtering method using Ti targets and an Ar–N2–O2 mixture discharge gas. The X-ray photoelectron spectroscopy survey spectra on the etched surfaces of TiON exhibited characteristic 2p, N 1s, O 1s peaks at corresponding binding energies 454.5, 397.0, 530.7 eV, respectively. surface topography these coatings was studied atomic force microscopy. Raman 200 641 cm−1 for TiN bonds 148, 398 ,and 518 TiO2 observed from Laser spectrometer. potentiodynamic polarization studies in simulated bodily fluid performed results are reported this article.